AI RESEARCH
LithoGRPO: Fast Inverse Lithography via GRPO Reinforced Flow Matching
arXiv CS.LG
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ArXi:2606.00228v1 Announce Type: new In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask. As circuit features shrink below the wavelength of light, optical diffraction causes the printed patterns to deviate from their intended layouts. Inverse Lithography Technology (ILT) addresses this challenge by generating optimized masks that enhance the fidelity of pattern transfer onto wafers.